Preparation of manganese silicide thin films by solid phase reaction

A thin film formation of MnSi and MnSi1.7 on a silicon substrate through solid phase reaction has been studied, where MnSi1.7 is one of the few semiconducting silicides, while MnSi is a metallic one. The growth process and electronic states of manganese silicides with composition of MnSi and MnSi1.7 are investigated by several methods, including soft X-ray emission spectroscopy.