Author/Authors :
Y. Murashige، نويسنده , , M. Tashiro، نويسنده , , T. Nakajyo، نويسنده , , T. Koizumi، نويسنده , , I. Kanazawa، نويسنده , , F. Komori، نويسنده , , Y. Ito، نويسنده ,
Abstract :
The positron annihilation parameter versus the incident positron energy is measured in the thin Fe films and the FeHf bilayer on silica substrate, by means of the variable energetic slow-positron beam technique. We have analyzed the change in open-volume spaces and vacancy-type defects among the Fe microcrystals in these thin films with the deposition temperature.
