Title of article
Photoemission study of vanadium deposition on Si(100)2 × 1
Author/Authors
T. Jikimoto، نويسنده , , M. Kisaka، نويسنده , , T. Shibasaki، نويسنده , , K. Yoshimoto، نويسنده , , M. Hirai، نويسنده , , M. Kusaka، نويسنده , , M. Iwami and M. Yanagihara، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1997
Pages
4
From page
384
To page
387
Abstract
The process of VSi(100)2 × 1 interface formation has been examined using low energy electron diffraction (LEED) and photoemission spectroscopy (PES) with synchrotron radiation (SR). The results allow us to conclude that the deposited V atoms interact chemically with Si atoms from the beginning of V deposition on the Si substrate.
Journal title
Applied Surface Science
Serial Year
1997
Journal title
Applied Surface Science
Record number
991610
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