Author/Authors :
Zhong-Tao Jiang، نويسنده , , Seungbum Hong، نويسنده , , Eunah Kim، نويسنده , , Byeong-Soo Bae، نويسنده , , Sungchul Lim، نويسنده , , Sang-Gyun Woo، نويسنده , , Young-Bum Koh، نويسنده , , Kwangsoo No، نويسنده ,
Abstract :
The investigation of single layer halftone phase shift mask (SLHTPSM) has been carried by both simulation and chromium fluoride film fabrication. Theoretical analysis provides the optimum SLHTPSM constructions for I-line (365 nm), KrF (248 nm) and ArF (193 nm) microlithographies. A fully characterization of chromium fluoride film processed by de magnetron sputtering shows a feasibility of using this film in the fabricating DUV-PSM.
