Title of article
Electrical characteristics of a triode with an n-SiMoAu double thin film/n-Si (n-Si/MoAu/n-Si) structure
Author/Authors
Yasuo Gekka، نويسنده , , Kazunori Satoh، نويسنده , , Kazuya Nagami، نويسنده , , Atsushi Harayama، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1997
Pages
4
From page
718
To page
721
Abstract
A new type triode device has been fabricated. The triode has electrodes at the end of two n-Si on both sides of n-Si/MoAu/n-Si structure and the third electrode on MoAu double film. The n-Si/MoAu/n-Si structure was made by contact of Mo and Au films forming Schottky barriers of n-SiMo and Aun-Si. In the measurement results of electrical characteristics of this triode, the function of active device or transistor action was observed.
Journal title
Applied Surface Science
Serial Year
1997
Journal title
Applied Surface Science
Record number
991625
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