• Title of article

    The impact of device scaling limits

  • Author/Authors

    Lewis M. Terman *، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1997
  • Pages
    10
  • From page
    1
  • To page
    10
  • Abstract
    The semiconductor market has been experiencing remarkable expansion, with a CGR approaching 30% over the last half decade. This growth has been driven by continuing device miniaturization and the attendant increase in integration level and performance and decrease in cost. However, as devices become smaller, there is concern that fundamental limits will rest&t further progress. Possible fundamental limits to device miniaturization and chip performance are considered. It is shown that while there are such limits, devices into the deep sub-O.1 mm region with acceptable characteristics could be built, providing that practical considerations in such areas as fabrication and lithography, design complexity, interconnect delay and fabrication facility cost can be overcome.
  • Keywords
    Scaling law , Device miniaturization
  • Journal title
    Applied Surface Science
  • Serial Year
    1997
  • Journal title
    Applied Surface Science
  • Record number

    991749