Title of article
Chemisorption of Ba on deuterium-terminated Si(100) surface
Author/Authors
Kaoru Ojima، نويسنده , , Shozo Hongo، نويسنده , , Zhuo-xiong Shao، نويسنده , , Toshio Urano، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1997
Pages
6
From page
82
To page
87
Abstract
The system of Ba overlayers deposited on a deutetium-terminated Si(100) surface was investigated by means of MDS
(metastable de-excitation spectroscopy) and TDS (thermal desorption spectroscopy). Deposition of Ba overlayers caused the
reduction of Si-D bond strength because of charge donation to Si substrate from Ba atoms. As a result, about half of
preadsorbed D atoms was released from the sample surface at 1 ML Ba deposition. The other half reacted with adsorbed Ba
atoms entirely to form Ba-D bonds. Therefore, all the Si-D bonds were lost, which is quite different from the
alkali/D/Si(lOO) system. More Ba deposition did not induce the desorption of D atoms. The formed Ba-D bonds are
considered to stay between the first and the second layer.
Keywords
barium , Si(100) , deuterium , TDS , MDS
Journal title
Applied Surface Science
Serial Year
1997
Journal title
Applied Surface Science
Record number
991762
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