Title of article :
Analysis of indium surface segregation in molecular beam epitaxy of InGaAs/GaAs quantum wells
Author/Authors :
Koichi Yamaguchi، نويسنده , , Tetsuya Okada، نويسنده , , Fumito Hiwatashi، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1997
Pages :
5
From page :
700
To page :
704
Abstract :
Pseudomorphic InGaAs/GaAs quantum wells (QWs) were grown by molecular beam epitaxy (MBE) under various growth conditions. Surface segregation of indium atoms during MBE growth influenced the QW structures, and the evidence was measured by a secondary ion mass spectroscopy and a low temperature photoluminescence. Calculated results based on a kinetic model of the surface segregation were compared with experimental ones. It was found that the change of InGaAs/GaAs heterointerface due to the surface segregation can be almost predicted by a kinetic model, and a segregation energy could be estimated.
Keywords :
Molecular Beam Epitaxy , Quantum well , heterointerface , kinetic model , Surface segregation
Journal title :
Applied Surface Science
Serial Year :
1997
Journal title :
Applied Surface Science
Record number :
991873
Link To Document :
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