Title of article :
Field emission from silicon including continuum energy and surface quantization
Author/Authors :
Qing-An Huang، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1997
Pages :
8
From page :
229
To page :
236
Abstract :
The quantum well in the surface of silicon arises from band bending which confines electrons to a narrow surface region during field emission. Based on the Wentzel-Kramer-Brillouin (WKB) approximation, a theory is presented for field emission from both the bulk with the continuum energy and the potential well with the quantized energy. The theory shows no exponential rise in emission current as the field increases at higher fields. The estimated emission current is also higher than that predicted by the classical theory.
Keywords :
Quantum well , Field emission , Silicon
Journal title :
Applied Surface Science
Serial Year :
1997
Journal title :
Applied Surface Science
Record number :
991927
Link To Document :
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