UHV-TPD study of NO adsorption/reaction over View the MathML source

The chemisorption state of NO adsorbed on View the MathML source was investigated by the TPD method in an UHV system and was discussed to be correlated with the NO decomposition mechanism. The three distinct states of NO adsorbed on View the MathML source (Tad = 175 K) are indicated by the appearance of the peaks at 210 K (α), 330 K (β) and 480 K (γ) with increasing exposure. It is found that the β peak is attributable to NO adsorbed on Cu+ ions, while the α peak is assigned to NO physically adsorbed on support. At high exposure pressure, a new peak is developed and N2 and N2O are produced during TPD, suggesting that a dinitrosyl species as an intermediate species for NO decomposition is formed.