Title of article :
Annealing effect on surfaces of 4H(6H)SiC(0001)Si face
Author/Authors :
T. Tsukamoto and M. Iwaki، نويسنده , , M. Hirai، نويسنده , , M. Kusaka، نويسنده , , M. Iwami and M. Yanagihara، نويسنده , , T. Ozawa، نويسنده , , T. Nagamura، نويسنده , , T. Nakata، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1997
Pages :
5
From page :
467
To page :
471
Abstract :
We have investigated 4H- and 6HSiC(0001)Si faces prepared by heat treatment using Auger electron spectroscopy (AES), low energy electron diffraction (LEED) and scanning tunneling microscopy (STM) in ultra high vacuum (UHV). The following were elucidated: 3 × 3 reconstruction was observed on the surface prepared at ∼ 1000°C, while 6 × 6 superstructure was observed for a specimen prepared at ∼ 1200°C. The 6 × 6 reconstruction can be explained as a moiré pattern produced by a graphite layer sitting on top of SiC surface. Also AES p-p height ration of Si(LVV)C(KLL) decreased at a higher temperature for 4HSiC than for 6HSiC, which could be due to the fact that the bond strength of 4HSiC is more than that of 6HSiC.
Journal title :
Applied Surface Science
Serial Year :
1997
Journal title :
Applied Surface Science
Record number :
992127
Link To Document :
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