Title of article :
Roughening and islanding of monolayer Ge coverage on vicinal Si(001) surface
Author/Authors :
L.W Guo، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1998
Pages :
6
From page :
213
To page :
218
Abstract :
Roughening and islanding of monolayer Ge coverage on vicinal Si(001) surface has been studied using scanning tunneling microscope (STM). For a 3.9° miscut surface, planar buckled-dimer surface is a metastable state limited by a barrier, which can be overcome by a 680°C annealing. After the annealing, the metastable flat surface has been changed to a rough surface of small hills because of step-bunching, and on top of each hill, a 3 dimensional (3D) nanoscale island was observed. The mechanism of this roughening and islanding process have been discussed.
Keywords :
Island , Mismatch epitaxy , Step-bunching , Surface morphology , Strain
Journal title :
Applied Surface Science
Serial Year :
1998
Journal title :
Applied Surface Science
Record number :
992373
Link To Document :
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