• Title of article

    Laser ablation deposition of crystalline copper-phthalocyanine thin films

  • Author/Authors

    E. Ina، نويسنده , , N. Matsumoto، نويسنده , , E. Shikada، نويسنده , , F. Kannari، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1998
  • Pages
    5
  • From page
    574
  • To page
    578
  • Abstract
    The poor crystallinity of copper-phthalocyanine CuPc.thin films fabricated via KrF laser ablation is significantly improved by three different assisting methods applied during deposition: 1. elevating substrate temperature only up to 508C; 2. irradiating with HeNe laser of ;200 mWrcm2; 3. applying DC electric field. Highest crystallinity is obtained when the film is deposited under DC electric field of ;50 Vrcm in the direction of film thickness. This in-process electric poling also works for 4-dialkylamino-4X-nitrostilbensen DANS.film. q1998 Elsevier Science B.V.
  • Keywords
    Organic thin films , Copper-phthalocyanine , Laser ablation deposition , Electric poling
  • Journal title
    Applied Surface Science
  • Serial Year
    1998
  • Journal title
    Applied Surface Science
  • Record number

    992488