Title of article
Laser ablation deposition of crystalline copper-phthalocyanine thin films
Author/Authors
E. Ina، نويسنده , , N. Matsumoto، نويسنده , , E. Shikada، نويسنده , , F. Kannari، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1998
Pages
5
From page
574
To page
578
Abstract
The poor crystallinity of copper-phthalocyanine CuPc.thin films fabricated via KrF laser ablation is significantly
improved by three different assisting methods applied during deposition: 1. elevating substrate temperature only up to 508C;
2. irradiating with HeNe laser of ;200 mWrcm2; 3. applying DC electric field. Highest crystallinity is obtained when the
film is deposited under DC electric field of ;50 Vrcm in the direction of film thickness. This in-process electric poling
also works for 4-dialkylamino-4X-nitrostilbensen DANS.film. q1998 Elsevier Science B.V.
Keywords
Organic thin films , Copper-phthalocyanine , Laser ablation deposition , Electric poling
Journal title
Applied Surface Science
Serial Year
1998
Journal title
Applied Surface Science
Record number
992488
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