Synthesis of TiO thin films by metalorganic pulsed molecular 2 beam deposition with an oxygen-radical beam source

Titanium oxide TiO2.thin films were synthesized on glass substrates by a metalorganic Ti i-OC3H7.4.pulsed molecular beam deposition method with an oxygen-radical beam source. The deposition rates of TiO2 were studied at various substrate temperatures with or without discharging the oxygen-radical beam source. Below the substrate temperatures of 3208C, TiO2 thin films were deposited only when the radical beam was impinged on the substrate. Above the substrate temperatures of 3808C, self decomposition of Ti i-OC3H7.4was the dominant decomposition channel. Dependence of the crystallinity of the films on the deposition conditions was discussed. q1998 Elsevier Science B.V. All rights reserved