Title of article :
Structure of nitride film hard coatings prepared by reactive magnetron sputtering
Author/Authors :
R. Manaila، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1998
Pages :
10
From page :
1
To page :
10
Abstract :
TiN, Ti1yxAlxN and ZrN films were deposited by electron-beam- assisted dc magnetron sputtering. X-ray diffraction showed different degrees of texture, depending on substrate bias, temperature and composition. In TiN films deposited with a high bias, microstructure changes were evidenced from lattice parameter trends, attributable to Ar inclusions. Ti1yxAlxN cubic solid solutions showed an average xs0.10. In ZrN films, a rhombohedrally-distorted phase is present, besides the cubic one. q1998 Elsevier Science B.V. All rights reserved.
Keywords :
TIN , ZrN , Reactive magnetron sputtering
Journal title :
Applied Surface Science
Serial Year :
1998
Journal title :
Applied Surface Science
Record number :
992760
Link To Document :
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