Title of article :
Droplet formation during laser sputtering of silicon
Author/Authors :
? Andrei?a، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1998
Pages :
8
From page :
73
To page :
80
Abstract :
High purity single-crystal silicon was ablated with nitrogen laser radiation wavelength 337 nm, pulse length 6 ns, maximal energy density 1.1 J/cm2, nonuniform target energy distribution. Many droplets were observed around the damaged target area, which seem to be ejected out of it and splashed vigorously onto the surrounding target surface. Their diameters are found to be in the range of a micrometer. The droplets were most probably produced within a single laser pulse as a result of hydrodynamical instability of the molten surface layer. Intense splashing occurs as a consequence of the large plume pressure generated by the most intense parts of the laser beam. The irregular power distribution on the target seems to enhance droplet formation significantly, since their abundance is drastically lower or even missing in similar experimental conditions but with uniform power distribution.
Keywords :
Silicon , Droplet formation , Hydrodynamical instability
Journal title :
Applied Surface Science
Serial Year :
1998
Journal title :
Applied Surface Science
Record number :
992855
Link To Document :
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