Photopolymerization by evanescent waves: characterization of photopolymerizable formulation for photolithography with nanometric resolution

We have recently introduced a photolithography process using photopolymerization by evanescent waves PEW.which is specially suitable for the fabrication of very thin films and parts of polymers from few nanometers to 1 mm.. In this work, the response of formulations with various concentrations of amine cosynergist is examined in terms of timerintensity reciprocity. q1999 Published by Elsevier Science B.V. All rights reserved.