Reaction products in light-induced microstructuring of Cu with Cl2

Cu plates are structured by light-induced dry etching with Cl2 and exposure to synchrotron radiation. The topography and the composition of the resulting CuCl films are studied with SEM, AFM, SAM and concentration profiles for Cu, Cl, as x well as C and O tracers are determined across the film thickness. Preferential reaction at the actual surface is identified and a scheme for the underlying Cu and Cl diffusion processes is derived. q1999 Elsevier Science B.V. All rights reserved