Electroless metallization of carbon substrates

Results are presented on electroless metallization of carbon via the formation of carbon nitride films. The proposed process, takes advantage of the strong chemical affinity of palladium towards nitrogenated species to cause the chemisorp- tion of the catalyst Pd.on the carbon nitride films. In the present work, thin carbon nitride CNx.films were deposited onto polycarbonate, glass or silicon substrates by DC magnetron sputtering of a graphite target in a reactive atmosphere pure nitrogen and nitrogen–argon mixture.. Deposition parameters of CNx films were optimised for the metallization itself through photoelectron spectroscopy XPS.and adhesion fragmentation test.measurements. q1999 Elsevier Science B.V. All rights reserved.