Title of article :
Tip cleaning and sharpening processes for noncontact atomic force microscope in ultrahigh vacuum
Author/Authors :
Masahiko Tomitori، نويسنده , , Toyoko Arai، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1999
Pages :
7
From page :
432
To page :
438
Abstract :
Tip cleaning and sharpening processes for noncontact atomic force microscope AFM.operated in ultrahigh vacuum UHV.were carried out and evaluated by a scanning Auger microscope SAM.with a field emission electron gun and a noncontact AFM in UHV combined with a scanning tunneling microscope and a field emission microscope. The cantilever used in this study was piezoresistive, which can be heated by passing a current through the resistive legs of the cantilever. As a pretreatment, the tip was irradiated with ultraviolet light in oxygen to remove carbon contaminants. It was heated at about 7508C to form a clean oxide layer in oxygen of 5=10y5 Torr in an SAM chamber. The desorption of the layer can make a remained tip apex sharper by heating under electron beam irradiation. A thermally oxidized layer was also eliminated by HF etching to sharpen the tip apex. The procedures are useful to obtain a well-defined Si tip suitable for a noncontact AFM. q1999 Elsevier Science B.V. All rights reserved
Keywords :
Noncontact atomic force microscope , Silicon tip , Cleaning , Sharpening
Journal title :
Applied Surface Science
Serial Year :
1999
Journal title :
Applied Surface Science
Record number :
995212
Link To Document :
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