Surface of TiO during atomic layer deposition as determined by 2 incremental dielectric reflection

We show that the measuring of the reflectance changes in transparent systems allows one to optically characterize the surface of films growing under the conditions of atomic partial-monolayer deposition. In the model, a continuous layer with effective optical parameters describes the growth front. Growing amorphous TiO2thin films from TiCl4and H2O at 1158C is used in demonstration experiments. q1999 Elsevier Science B.V. All rights reserved