Title of article :
Scanning tunneling microscopy observation of
hydrogen-terminated Si 001/surfaces after rinsing in ultrapure
water with low dissolved oxygen concentration
Author/Authors :
K. Usuda )، نويسنده , , K. Yamada، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1999
Abstract :
Scanning tunneling microscopy STM.observations have been employed to observe hydrogen-terminated Si 001.
surfaces prepared by rinsing in ultrapure water UPW.with very low dissolved oxygen DO.after removal of the native
oxide using 1% HF acid at room temperature. Domed-shaped protrusions with height in nanometers, hut-shaped clusters
parallel to the 110:, and terraces parallel to the Si 001.surfaces were observed on the UPW-treated surfaces. The shape of
the protrusions emerge even after 30 min rinsing and the roughness of the Si 001.surface increased with increasing duration
of UPW rinsing. The morphology variation due to the rinsing is consistent with the results obtained from attenuated-total-re-
flectance Fourier-transmittance infrared ATR-FT-IR.measurement. q1999 Elsevier Science B.V. All rights reserved
Keywords :
Surface structure , Ultrapure water UPW. , Scanning tunneling microscopy STM. , Silicon etching , Dissolved oxygen DO. , roughness and rinsing , morphology
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science