Azide complexes as forerunners for metallic thin films on Si surfaces

The deposition of films of metals, metal oxides and metal nitrides on surfaces has attracted a great deal of interest due to their importance in the semiconductor industry. An alternative method, which totally avoids the resist technology, is to use the photodecomposition of azide complexes layers. We have initiated a study about photodecomposition of new compounds wCr N3.L H2O.2x NO3.2, wNi N3.2L2xP10H2O, wCuN3Lx NO3. Lstriethanolamine. and wCr N3.LX H2O.4x NO3.2, wCu N3.LX H2O.2x NO3. LXsdiethanolamine. comparatively with wCr NH3.5N3x2q, wNi NH3.5N3xq and wCu NH3.3N3xq. We have selected the best wavelengths for each of the complexes after a detailed study of UV-spectra. q1999 Elsevier Science B.V. All rights reserved.