Nanoparticles of Si–C–N from low temperature RF plasmas: selective size, composition and structure

Silane-based rf plasma CVD is used to produce nanostructured materials. Depending on the discharge conditions, either ultrafine powder of alloys Si–C–N., with potential applications for advanced ceramics, or nanostructured thin films grown in the presence of nanoparticles, can be obtained. The present study deals with the synthesis of nanoparticles based on the Si–C–N system in plasmas of SiH4, CH4, NH3and Ar. Ultrafine quasi-monodisperse powder particles of controlled mean size were produced in conditions of fast particle development. Before the onset of particle coagulation, non-agglomerated amorphous clusters smaller than 10 nm were obtained. q1999 Elsevier Science B.V. All rights reserved