Title of article :
First stages of growth of CdS films on different substrates
Author/Authors :
A.I. Oliva )، نويسنده , , R. Castro-Rodr´?guez، نويسنده , , O. Ceh، نويسنده , , P. Bartolo-Pe´rez 1، نويسنده , , F. Caballero-Briones 2، نويسنده , , V´?ctor Sosa، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1999
Pages :
8
From page :
42
To page :
49
Abstract :
Cadmium sulfide films were grown on glass, silicon, and ITO substrates by chemical-bath deposition CBD.at 358 K, and studied by atomic force microscopy, Auger electron microscopy and X-ray diffraction. CdS film growth initiates immediately and thickness increases with deposition time. The rms roughness of CdS films grown for 1 to 10 min thicknesses of 10 to 70 nm.was measured by atomic force microscopy. The roughness of films grown on ITO remains similar to that of the substrate regardless of deposition time. On the other hand, the roughness of CdS films grown on glass and silicon increases with deposition time, finally reaching a roughness similar to that of films grown on ITO. Auger profiles show that the CdSrsubstrate interface is not abrupt and depends on the substrate. Substrate roughness plays an important role during the initial CdS growth process. X-ray studies show that silicon substrates are not appropriate for CdS film growth by CBD. The most appropriate substrate is ITO. q1999 Elsevier Science B.V. All rights reserved.
Keywords :
Silicon substrate , CdS films , ITO substrates , glass substrate
Journal title :
Applied Surface Science
Serial Year :
1999
Journal title :
Applied Surface Science
Record number :
995665
Link To Document :
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