Title of article
Synthesis of crystalline C N by MPCVD
Author/Authors
D.X Shi، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1999
Pages
6
From page
50
To page
55
Abstract
In this study, carbon nitride thin films are synthesized on Si and Pt substrates by microwave plasma chemical vapor
deposition MPCVD.. The major part of the films is composed of a-C3N4 and b-C3N4. XPS and FT-IR spectra strongly
support the existence of C–N covalent bonds in C3N4. Raman spectra also support the existence of b-C3N4. The carbon
nitride films on Pt substrates have a high bulk modulus of 349 GPa. q1999 Published by Elsevier Science B.V. All rights
reserved.
Keywords
Carbon nitride , B-C3N4 , CN , Thin film , hardness , MPCVD
Journal title
Applied Surface Science
Serial Year
1999
Journal title
Applied Surface Science
Record number
995666
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