Title of article :
Titanium oxide reduction in ion depth profiling
Author/Authors :
L.I. Vergara، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1999
Abstract :
Through Factor Analysis and Auger Electron Spectroscopy AES., we have studied the alterations introduced in the
analysis of chemically complex samples TiO2.by the normal procedure of ion bombardment depth profiling. We studied
the effect of the energy, current density and mass of the impinging particles on the oxide film composition. We found that
the procedure generates in the sample lower oxide states TiO., and that while this effect is independent of the energy and
ion density, it presents a clear dependence on the mass of the impinging ion. Through the comparison of different depth
profiles obtained by sputtering with a couple of different ions, we obtain a better characterization of the oxide films. q1999
Elsevier Science B.V. All rights reserved
Keywords :
TiO2 , FA , Sputtering , reduction , AES , depth profiling
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science