A surface chemistry investigation of the low pressure nitridation of Si 100/using 1,1-dimethylhydrazine

The adsorption and decomposition of 1,1-dimethylhydrazine DMHy.on Si 100.and the low pressure nitridation of Si 100. using DMHy were investigated using X-ray photoelectron spectroscopy XPS. and temperature-programmed desorption TPD.. DMHy dissociatively adsorbs on Si 100.at 310 K with the cleavage of both N–N and N–H bonds. TPD and XPS show that dimethylamine desorption results in the complete removal of all the carbon on the surface by ;600 K. Nitridation of the Si 100.surface between approximately 600 and 720 K using DMHy results in the adsorption of only NHx species with carbon contamination below XPS detection. In this temperature window, the nitrogen species and coverage are very similar to that found using ammonia NH3.as the nitridant. q1999 Elsevier Science B.V. All rights reserved