Ablation study on pulsed KrF laser annealed electroluminescent ZnS:MnrY O multilayers deposited on Si

The ZnS:Mn active layer of a thin film electroluminescent TFEL.device has been annealed under 1.034 MPa 10.34 bar, 150 psi. of argon pressure using a 20-ns pulsed KrF excimer laser. We investigate the effects of multiple shots at various power densities upon the ablation rates of the ZnS:Mn layer. The results are compared to a thermal simulation of the laser-matter interaction using single pulse irradiation, and it is inferred that the cubic to hexagonal transition and melting of ZnS:Mn decrease the ablation rate. q2000 Published by Elsevier Science B.V. All rights reserved.