Title of article :
Preparation of single crystalline regions in amorphous silicon
layers on glass by Arq laser irradiation
Author/Authors :
G. Andr¨a، نويسنده , , J. Bergmann، نويسنده , , Adam F. Falk، نويسنده , , E. Ose، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2000
Abstract :
By melting amorphous silicon layers on glass by the beam of an Arq laser, large grained polycrystalline films as well as
single crystalline regions at predefined positions were generated.
If the layers are crystallized by scanning a circular laser beam at a rate of up to 5 cmrs the crystal size depends on the
overlap between successive scanning traces. The lateral dimensions of the crystals exceed several 10 mm for an overlap
slightly above 50%. Crystals with size dimensions of about 100 mm were produced by line scanning of a focused laser
beam.
Large single crystals were obtained by scanning a sickle-shaped or L-shaped beam profile. If the laser is switched on and
off repeatedly, single crystalline regions are produced at predefined positions. q2000 Published by Elsevier Science B.V.
All rights reserved.
Keywords :
Polycrystalline silicon layers , Laser crystallization
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science