Title of article :
Pulsed laser deposition of ZnO thin films using a femtosecond laser
Author/Authors :
Masayuki Okoshi، نويسنده , , Kouji Higashikawa، نويسنده , , Mitsugu Hanabusa، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2000
Pages :
4
From page :
424
To page :
427
Abstract :
Transparent, conductive ZnO films were deposited by pulsed laser deposition PLD.using 790-nm, 130-fs laser pulses. An optical transmittance as high as 88% in the visible region was obtained when deposited above 1508C. The electrical resistivity of the films was 10y1 to 10y3 V cm between room temperature and 2708C. Sharp X-ray diffraction XRD.peaks were observed for films deposited above 1508C on both quartz and Si. The results were obtained in absence of oxygen gas during the deposition, unlike in previous PLD where nanosecond laser pulses were used. q2000 Elsevier Science B.V. All rights reserved
Keywords :
Femtosecond laser , ZnO film , Pulsed laser deposition , Transparency , Electric conduction
Journal title :
Applied Surface Science
Serial Year :
2000
Journal title :
Applied Surface Science
Record number :
995951
Link To Document :
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