Title of article :
The effect of different scanning schemes on target and film properties in pulsed laser deposition of bismuth
Author/Authors :
A. Jacquot، نويسنده , , M.O. Boffoue´، نويسنده , , B. Lenoir، نويسنده , , A. Dauscher، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2000
Pages :
8
From page :
169
To page :
176
Abstract :
Thin bismuth films have been prepared on glass substrates at room temperature by pulsed laser deposition with a Nd:YAG laser working at a wavelength of 532 nm. The influence of both target diameter and the way of scanning the laser beam over the target surface on the film quality droplet density and film thickness homogeneity.was studied. Scanning electron microscopy and thickness profile analyses were performed on the films. Three different laser beam scanning schemes have been simulated and tested. Films of high quality are obtained using the highest possible target area eroded in the most homogeneous way. This was achieved with an appropriate scanning of the laser beam over the target, for instance with a ‘crenel’ like scanning or with a scanning at varying speed. Results are discussed in relation to target roughness. q2000 Elsevier Science B.V. All rights reserved.
Keywords :
SCANNING ELECTRON MICROSCOPY , Thickness profiles , Laser beam scanning , Bismuth , Pulsed laser deposition
Journal title :
Applied Surface Science
Serial Year :
2000
Journal title :
Applied Surface Science
Record number :
996020
Link To Document :
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