Title of article :
Comparison of InGaAs 100/grown by chemical beam epitaxy and metal organic chemical vapor deposition
Author/Authors :
M.D. Williams، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2000
Pages :
6
From page :
123
To page :
128
Abstract :
Secondary ion mass spectrometry is used to study the effects of substrate temperature on the composition and growth rate of InGaAsrInP 100. multilayers grown by chemical beam epitaxy, metal-organic chemical vapor deposition and solid source molecular beam epitaxy. The growth kinetics of the material grown by the different techniques are analyzed and compared. q2000 Elsevier Science B.V. All rights reserved
Journal title :
Applied Surface Science
Serial Year :
2000
Journal title :
Applied Surface Science
Record number :
996042
Link To Document :
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