XPS analysis of Pb Zr Ti /O thin film after dry-etching by 0.52 0.48 3 CHF plasma

The CHF3 plasma etched PbZr0.53Ti0.47O3 PZT.surface was chemically analyzed in order to investigate the dry-etching machining process of PZT thin film. X-ray photoelectron spectroscopy XPS.results indicated that PbF2, ZrF4and polymer containing C, H and F formed and remained on the etched surface during the dry-etching process while the Ti was almost completely removed. The removal of the PbF2 was a key issue for getting a high etching rate. q2000 Published by Elsevier Science B.V.