• Title of article

    Tracing the valence band maximum during epitaxial growth of HfS on WSe 2 2

  • Author/Authors

    Uwe C. Kreis، نويسنده , , M. Traving، نويسنده , , R. Adelung، نويسنده , , L. Kipp، نويسنده , , M. Skibowski، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2000
  • Pages
    6
  • From page
    17
  • To page
    22
  • Abstract
    Applying angle resolved photoemission and scanning tunneling microscopy STM.during different stages of epitaxial growth of HfS2 on WSe2 allows an evaluation of the electronic valence band spectra as a function of position z perpendicular to the interface. In combination with photon energy dependent photoemission measurements of clean WSe2 and HfS2 samples, mapping kH dispersions of valence bands’ reliable values for the valence band maxima VBM.have been obtained. Upon different stages of growth, the valence band maximum can thus be traced during the build up of the interface giving an accurate value for the valence band offset of this heterojunction. q2000 Elsevier Science B.V. All rights reserved.
  • Keywords
    van der Waals epitaxy , Semiconductor heterojunction , layered materials , Valence band offset , Photoemission spectroscopy
  • Journal title
    Applied Surface Science
  • Serial Year
    2000
  • Journal title
    Applied Surface Science
  • Record number

    996474