Title of article
Tracing the valence band maximum during epitaxial growth of HfS on WSe 2 2
Author/Authors
Uwe C. Kreis، نويسنده , , M. Traving، نويسنده , , R. Adelung، نويسنده , , L. Kipp، نويسنده , , M. Skibowski، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2000
Pages
6
From page
17
To page
22
Abstract
Applying angle resolved photoemission and scanning tunneling microscopy STM.during different stages of epitaxial
growth of HfS2 on WSe2 allows an evaluation of the electronic valence band spectra as a function of position z
perpendicular to the interface. In combination with photon energy dependent photoemission measurements of clean WSe2
and HfS2 samples, mapping kH dispersions of valence bands’ reliable values for the valence band maxima VBM.have
been obtained. Upon different stages of growth, the valence band maximum can thus be traced during the build up of the
interface giving an accurate value for the valence band offset of this heterojunction. q2000 Elsevier Science B.V. All rights
reserved.
Keywords
van der Waals epitaxy , Semiconductor heterojunction , layered materials , Valence band offset , Photoemission spectroscopy
Journal title
Applied Surface Science
Serial Year
2000
Journal title
Applied Surface Science
Record number
996474
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