Title of article :
Formation of the CorSi 111/7=7 interface: AES- and EELS-study
Author/Authors :
N.I. Plusnin)، نويسنده , , A.P. Milenin، نويسنده , , D.P. Prihod’ko، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2000
Pages :
5
From page :
125
To page :
129
Abstract :
Formation of the CorSi 111.7=7 interface has been investigated by methods of electron energy loss spectroscopy EELS.and Auger-electron spectroscopy AES.. The sequence of surface and thin-film phases at ds0–1, 2 and 3 ML, and Co-terminated bulk phases CoSi2, CoSi, Co2Si.at ds4, 6–11, and 13–30 ML has been established. It has been shown that the structure of phases at ds0–1 ML changes during annealing, while that at ds2 ML does not change. At d,3 ML, a phase extending on thickness with layered structure, which transforms into CoSi2 at T)4508C, has been detected. This phase type grows in a wide composition range up to Co thickness of 11 ML under the layer-by-layer Co deposition and annealing. q2000 Elsevier Science B.V. All rights reserved
Keywords :
Cobalt , Single crystal surface , Surface chemical reaction , Auger-electron spectroscopy , Silicon , Electron energy loss spectroscopy
Journal title :
Applied Surface Science
Serial Year :
2000
Journal title :
Applied Surface Science
Record number :
996494
Link To Document :
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