Title of article :
Effects of surface corrugation on the molecular rotational dependence of H2 dissociative adsorption dynamics on Cu(100)
Author/Authors :
Yoshio Miura، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Pages :
6
From page :
30
To page :
35
Abstract :
We investigate and discuss how surface corrugation affects the molecular rotational dependence of H2 dissociative adsorption dynamics on Cu(100) by performing six-dimensional (6D) quantum dynamics calculations. We calculate the dissociative adsorption probability as a function of the initial rotational state J and the normal energy Enorm of incident molecules, and compare with the dissociative adsorption results obtained by four-dimensional (4D) quantum dynamics calculations where the surface is treated as ¯at. In our calculation, for the case of normal incidence, the increase in dissociative adsorption probability with increasing Enorm and the non-monotonic behavior of dissociative adsorption probability with respect to J are suppressed on a corrugated surface as compared to that on a ¯at surface. # 2001 Elsevier Science B.V. All rights reserved
Keywords :
Models of surface chemical reactions , Molecular dynamics , Molecular rotation , Surface corrugation , copper , hydrogen
Journal title :
Applied Surface Science
Serial Year :
2001
Journal title :
Applied Surface Science
Record number :
996679
Link To Document :
بازگشت