Thin ®lm properties by facing targets sputtering system

In this study, ®lm thickness distribution and c-axis crystalline orientation of deposited thin ®lms were studied after preparing Co±Cr thin ®lms, a promising ultra-high density perpendicular magnetic recording media, with a facing targets sputtering (FTS) apparatus. Electrical discharge characteristics needed for the optimum operation of sputter device was also studied in order to prepare thin ®lms of superior c-axis crystalline orientation with FTS method (apparatus) in which thin ®lm of ®ne quality can be formed because temperature increase of substrate due to the bombardment of high-energy particles can be restrained. As a result of the study, it is con®rmed that the FTS method can give stable working under broad magnetic ®eld and range of gas pressure and stable electrical discharge under low Ar gas pressure. Film thickness of prepared thin ®lm shows fairy regular distribution and could obtain good thin ®lms whose dispersion angle of c-axis crystalline orientation is about 3.58. # 2001 Elsevier Science B.V. All rights reserved.