Title of article :
Photocatalytic TiO2 thin-®lms deposited by a pulsed laser deposition technique
Author/Authors :
Masahiro Terashima، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Pages :
4
From page :
535
To page :
538
Abstract :
TiO2 thin ®lms were deposited on Si(1 0 0) substrates by pulsed laser deposition technique using Nd:YAG laser. A high deposition rate of 4.6 nm/min at a laser ¯uence of 6.5 J/cm2 and a pulse repetition frequency of 30 Hz was obtained. The Xray diffraction patterns of the ®lms were studied as a function of the ®lm thickness. The results show that the 700 nm-thick ®lms consisted of anatase and rutile structure. As ®lm thickness increased, the amount of anatase phase crystal increased, whereas the rutile remained constant. # 2001 Elsevier Science B.V. All rights reserved
Keywords :
rutile , anataseand brookite. Of these , the anatase crystal isknown as the most active photocatalytic material.When the anatase crystal of TiO2 is irradiated withthe ultra violet light (hn > 3:2 eV) , it can decompose water and/or contaminantsadsorbed on the TiO2 surface.There are many reports on TiO2 thin ®lms depositedby reactive , electron±holepairs are created. Since a hole is a powerful oxidizingagent , pulsed laser deposition , TiO2 , Anatase-crystal , photocatalysis , concern for hygiene in our livingenvironment has increased. A photocatalytic effectusing titanium oxide (TiO2) has been of growinginterest in the ®eld of environmental puri®cation , since it is harmless to humans. There are three differentcrystalline phases of TiO2 , Thin ®lm1. IntroductionIn recent years , namely
Journal title :
Applied Surface Science
Serial Year :
2001
Journal title :
Applied Surface Science
Record number :
996782
Link To Document :
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