Title of article
Crystal structure and deposition rate of PbTiO3 ®lms prepared on glass and platinum substrate by rf sputtering
Author/Authors
Shoichi Mochizuki، نويسنده , , Toshiyuki Mihara، نويسنده , , Shigeharu Tamura، نويسنده , , Tadashi Ishida، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2001
Pages
3
From page
557
To page
559
Abstract
Lead titanate (PbTiO3) thin ®lms were prepared by rf magnetron sputtering using ceramic target. Perovskite phase PbTiO3
was obtained on platinum-coated glass substrate at substrate temperature of 5808C. On the contrary, crystal structure of the
®lms on glass substrate was amorphous. After this ®lm was annealed at 5008C in air, crystal structure was converted to
perovskite one.
In proportion to the rf power, deposition rate increased. When rf power and substrate temperature were 300 Wand 5808C,
deposition rates of the ®lms deposited on glass substrate and platinum-coated glass were 50 and 20 nm/min, respectively.
# 2001 Elsevier Science B.V. All rights reserved.
Keywords
Lead Titanate , Thin ®lm , Sputtering , deposition rate
Journal title
Applied Surface Science
Serial Year
2001
Journal title
Applied Surface Science
Record number
996787
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