Studies on reactive sputtering process of TiN ®lms using small mass analyzers

Investigation on the reactive sputtering plasma process for the TiN ®lms has been carried out, using small mass analyzers located in a discharge vessel without differential pumping units. A reaction mechanism is studied on time-dependent data of the transition of a Ti-target surface from nitride to the metallic state. The ¯ux of ionic species from the plasma has been measured as well, and is discussed in association with the electric potential formation. # 2001 Elsevier Science B.V. All rights reserved