The characteristics of some metallic oxides prepared in high vacuum by ion beam sputtering

The characteristics of ion beam sputtered metallic oxides deposited in high vacuum are analyzed by X-ray diffractometer, atomic force microscopy, spectrophotometer and ellipsometer. The metallic oxide thin ®lms include aluminum oxide, niobium oxide, silicon oxide, tantalum oxide, zirconium oxide, and titanium oxide. The structure, surface morphology and optical constant are described. An oxide ®lm with low surface roughness, low extinction coef®cient and high packing density is crucial for an optical application. We found that to make such a high quality ®lm there is an optimum deposition condition and an optimum post-baking temperature. Moreover, the optimum deposition condition and the optimum post-baking temperature are different for different metallic oxides. # 2001 Elsevier Science B.V. All rights reserved