• Title of article

    Laser-assisted metal deposition from liquid-phase precursors on polymers

  • Author/Authors

    K. KordaAs، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2001
  • Pages
    12
  • From page
    178
  • To page
    189
  • Abstract
    In this work, a short review is presented for results utilizing the technique of laser-assisted metallization of dielectrics. Experimental efforts and results related to the metal (palladium (Pd), copper (Cu) and silver (Ag)) deposition on polymeric materials (polyimide (PI), mylar) are reported. These polymers and metals are chosen due to their growing importance in the rapidly-developing microelectronics packaging industry. The method of laser-induced chemical liquid-phase deposition (LCLD) offers many advantages compared to other techniques such as laser-induced forward transfer (LIFT), pulsed-laser deposition (PLD) and laser-assisted chemical vapor-phase deposition (LCVD). The LCLD is time and cost effective because vacuum tools and special pre-treatments are not required. The consumed chemicals used in precursors are non-harmful and easy to handle due to the liquid phase. For the optimal physical and chemical properties of deposits, the laser and solution parameters are varied. XeCl and KrF excimer and Ar‡ lasers are employed for executing the palladium, Ag and/or Cu formation on the polymer substrates. Chemical and physical analyses of the formed metal patterns are performed by EDX, XRD, FESEM, SEM, resistance and adhesion measurements. # 2001 Elsevier Science B.V. All rights reserved
  • Keywords
    Metallization , Integrated circuits , Polymers , radiation effects , Laser radiation , deposition , Films andcoatings , surface irradiation effects , Chemical reaction kinetics
  • Journal title
    Applied Surface Science
  • Serial Year
    2001
  • Journal title
    Applied Surface Science
  • Record number

    996895