An expanding thermal plasma for deposition of surface textured ZnO:Al with focus on thin ®lm solar cell applications

A new method for low temperature deposition of surface textured ZnO:Al is presented utilizing an expanding thermal plasma created by a cascaded arc. Films are deposited at 2008C at the rate of 0.65±0.75 nm sÿ1 exhibiting low resistivity (<10ÿ3 O cm), high visible transmittance (>80%) and a rough surface texture. First application in p-i-n a-Si:H solar cells indicates promising light trapping properties. # 2001 Elsevier Science B.V. All rights reserved.