Title of article :
The origin of haze in CVD tin oxide thin films
Author/Authors :
J?nos Szanyi، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2002
Pages :
11
From page :
161
To page :
171
Abstract :
The origin of haze was investigated in antimony-doped tin oxide thin films, and in double-stack thin films of fluorine-doped tin oxide/antimony-doped tin oxide, both deposited by chemical vapor deposition onto soda-lime–silica float glass substrates. These transparent conductive oxide thin films are of great importance in the production of solar control architectural glazing units. Therefore, understanding the origins of haze is necessary to the development of coated, IR-reflecting glass windows with low overall haze levels. Haze measurements of as-prepared and polished samples were correlated with surface roughness and concentration of internal hole defects. Surface roughnesses were evaluated by atomic force microscopy, and characterized by estimated RMS values. In thin tin oxide films (<2000 Å) internal hole defects caused haze, while in thick tin oxide films (>4000 Å) surface roughness was the primary source of haze.
Keywords :
Tin oxide thin films , Haze , Rugosity , Polishing , AFM , Internal defects
Journal title :
Applied Surface Science
Serial Year :
2002
Journal title :
Applied Surface Science
Record number :
997523
Link To Document :
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