Fabrication of photonic structures by means of interference lithography and reactive ion etching

In this study, the fabrication of two-dimensional photonic structures by means of interference lithography is discussed. The proposed method provides flexible formation of various configuration two-dimensional interference patterns depending on the number of beams and their interorientation. Mainly, triangular and square lattice configurations are modeled. It is shown that the dimensions of substructure increase with the number of beams superpositioning. Mask fabrication by SF6/N2 reactive ion etching, while transferring the pattern onto silicon substrate is presented.