Title of article :
Influence of interface structures on Sn thin film growth on Si(1 1 1) surface
Author/Authors :
J.T. Ryu، نويسنده , , T. Fujino، نويسنده , , M. Katayama، نويسنده , , Y.B. Kim، نويسنده , , K. Oura، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2002
Abstract :
Using coaxial impact collision ion scattering spectroscopy, we have investigated Sn thin film growth on Si(1 1 1)√3×√3-Sn and hydrogen-terminated Si(1 1 1) surfaces at room temperature. Sn formed crystalline film with β-Sn structure on Si(1 1 1)√3×√3-Sn surface, but on the hydrogen-terminated Si(1 1 1) surface, the epitaxial growth of Sn thin film was disrupted, and Sn grew as a polycrystalline film. The growth orientational relationship of the Sn film grown on Si(1 1 1)√3×√3-Sn surface was found to be Sn(1 0 0)〈0 1 0〉//Si(1 1 1)〈0 1̄ 1〉. In the works, we found that interface structure plays a decisive role for the growth mode, crystallinity, and growth orientation of the growth of thin film.
Keywords :
Epitaxial growth , Interface , Ion scattering spectroscopy , Si(1 1 1) , CAICISS , ?3×?3-Sn structure , Hydrogen termination , Sn
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science