Title of article
Gate control characteristics in GaAs nanometer-scale Schottky wrap gate structures
Author/Authors
Miki Yumoto، نويسنده , , Seiya Kasai a، نويسنده , , Hideki Hasegawa a، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2002
Pages
5
From page
242
To page
246
Abstract
Gate control characteristics of GaAs-based quantum wire transistors (QWRTrs) controlled by a nanometer-scale Schottky wrap gate (WPG) are investigated theoretically and experimentally. Gate bias dependence of the effective wire width of fabricated WPG QWRTrs determined theoretically as well as experimentally from Landau plots showed that the nanometer-scale WPG controls the potential very tightly near channel pinch-off and that the pinch-off threshold voltage is strongly dependent on the gate length, LG, when LG is shorter than 400 nm. The theory based on the three-dimensional (3D) potential simulation pointed out that Fermi level pinning on the semiconductor surface around the WPGs strongly affects the gate controllability in the nanometer-scale Schottky WPG structure.
Keywords
Fermi level pinning , Threshold voltage , Short channel effect , Quantum wire transistor , Wrap gate , Schottky contact
Journal title
Applied Surface Science
Serial Year
2002
Journal title
Applied Surface Science
Record number
997866
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