• Title of article

    Energy distributions and excitation probability of nickel atoms sputtered from Ni3Al, NiAl and Ni

  • Author/Authors

    M Tan، نويسنده , , B.V King، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2003
  • Pages
    4
  • From page
    248
  • To page
    251
  • Abstract
    The resonant electron tunnelling (RET) model for the sputtering of atoms in excited electronic states has been tested for Ni atoms sputtered from Ni, Ni3Al and NiAl. Laser sputter neutral mass spectrometry using one-colour two-photon ionisation schemes has been used to measure the relative yields of atoms sputtered into the 3F ground atomic state and the 3D metastable state. It is found that more Ni atoms are sputtered into the excited state than the ground state, and that the energy distribution of sputtered atoms peaks at a higher energy for the excited state compared to the ground state, as found previously. In addition the relative population of the 3D state is more pronounced for NiAl than for Ni3Al or Ni. This is due to the increased interaction strength in NiAl, due to greater overlapping between the surface and atomic electronic structures.
  • Keywords
    Sputtering , Excited states , Nickel alloy , Laser postionisation
  • Journal title
    Applied Surface Science
  • Serial Year
    2003
  • Journal title
    Applied Surface Science
  • Record number

    998431