Title of article
Application of SIMS in microelectronics
Author/Authors
T. K. Tsukamoto ، نويسنده , , S. Yoshikawa، نويسنده , , F. Toujou، نويسنده , , H. Morita، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
5
From page
404
To page
408
Abstract
This paper, the present state and problems of secondary ion mass spectrometry are discussed from the viewpoint of characterization, both for various semiconductor and microelectronic materials and also in relation to other evaluation methods.
Keywords
TOF-SIMS , LEIS , XPS , Growth mode
Journal title
Applied Surface Science
Serial Year
2003
Journal title
Applied Surface Science
Record number
998466
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